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當前位置:首頁   >  產品中心  >  二維材料  >  二維材料薄膜  >  機械剝離單層二硫化鉬薄膜

機械剝離單層二硫化鉬薄膜

簡要描述:Monolayer molybdenum disulfide (1H-MoS?) flakes have been exfoliated from bulk molybdenum disulfide (2H-MoS?) onto 90nm thermal oxide and measures from 5 micron up to 40 micron in size.

  • 更新時間:2024-06-03
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  • 廠商性質:生產廠家
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Monolayer molybdenum disulfide (1H-MoS?) flakes have been exfoliated from bulk molybdenum disulfide (2H-MoS?) onto 90nm thermal oxide and measures from 5 micron up to 40 micron in size. Each sample contains at least one single-layer MoS? and is easy to find with the given x and y coordinates. Optical images and preliminary tests come with the product. Typically, single-layer MoS? show strong PL at 1.85-1.88 eV with 0.04 to 0.1eV FWHM, and the Raman peaks are located at 386cm-1 (E2g in-plane mode) and 404 cm-1 (A1g out-of-plane mode). Characterization Raman spectroscopy: Raman spectroscopy is data is taken on every single-layer flakes. Typically, flakes show two prominent Raman peaks at 386cm-1 (E2g- in plane-) and 404cm-1 (A1g out-of-plane) and the FWHM (full-width-at-half-maximum) is less than 5cm-1. Photoluminescence (PL): In the single layer form, molybdenum disulfide possesses direct band-gap at 1.85eV (670nm). PL measurements show strong PL peak located at 1.85eV (670nm) with 0.04-0.10 eV PL FWHM. Optical Microscope images: Each sample is inspected under the optical microscope and x-y coordinates are recorded. Contact us for more information

Possible applications:
Electronics
Sensors - detectors
Optics
STM – AFM applications
Molecular detection – binding
Ultra-low friction studies
Materials science and semiconductor research


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